发明名称 SEMICONDUCTOR DEVICE MANUFACTURING CARRIER
摘要 <p>PROBLEM TO BE SOLVED: To protect a semiconductor device against cracking caused by warpage even if a metal frame is used by a method wherein the metal frame bonded in the periphery of the one side of an insulating tape is prescribed in linear expansion coefficient. SOLUTION: A semiconductor device manufacturing carrier is composed of an insulating flexible tape 2 and a metal frame 1. A wiring layer formed of copper foil or the like is provided in both sides or one side of the flexible tape 2. The wiring layer is formed into a prescribed wiring pattern in a region 14. Transfer holes are provided in the periphery of the metal frame 1 to transfer the carrier. The metal frame 1 (Fig. a) is equipped with an opening 16 at its center corresponding to the wiring layer region 14 of the flexible tape 2. Adhesive agent 3 is provided in the one side of the metal frame 1 surrounding the opening 16. The metal frame 1 has a linear expansion coefficient of 11.5 ppm/k to 17.5 ppm/k. For instance, copper alloy can be applied to the metal frame 1.</p>
申请公布号 JPH11219959(A) 申请公布日期 1999.08.10
申请号 JP19980021672 申请日期 1998.02.03
申请人 HITACHI CABLE LTD 发明人 HATANO KAZUHISA;TAKEYA NORIAKI;YASUDA TOMO;YOSHIOKA OSAMU;MURAKAMI HAJIME
分类号 H01L21/60;H01L21/50;H05K1/02;(IPC1-7):H01L21/50 主分类号 H01L21/60
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