发明名称 Magnetic thin film and magnetic thin film manufacturing method
摘要 A magnetic thin film manufacturing method in which an object of treatment is electroplated in a plating bath so that a magnetic thin film is formed on the surface of the object of treatment. The plating bath contains two or more types of ions selected from a set consisting of Fe2+ ions, Ni2+ ions and Co2+ ions, and fine particles of an insulating material are dispersed in the plating bath. In a more particular embodiment of the invention, a magnetic thin film manufacturing method is characterized by the fact that [a] the aforementioned two or more types of ions selected from a set consisting of Fe2+ ions, Ni2+ ions and Co2+ ions are supplied by means of sulfates and/or chlorides, [b] the plating bath is an acidic bath, and [c] the fine particles of an insulating material that are dispersed in the plating bath are colloidal particles of SiO2 and/or Al2O3.
申请公布号 US5935403(A) 申请公布日期 1999.08.10
申请号 US19970881300 申请日期 1997.06.24
申请人 READ-RITE SMI CORPORATION 发明人 SUZUKI, KOICHI;KOMAKI, KENJI
分类号 C25D5/26;C25D15/02;G11B5/31;H01F10/00;H01F10/16;H01F41/26;(IPC1-7):C25D15/00 主分类号 C25D5/26
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