发明名称 |
Magnetic thin film and magnetic thin film manufacturing method |
摘要 |
A magnetic thin film manufacturing method in which an object of treatment is electroplated in a plating bath so that a magnetic thin film is formed on the surface of the object of treatment. The plating bath contains two or more types of ions selected from a set consisting of Fe2+ ions, Ni2+ ions and Co2+ ions, and fine particles of an insulating material are dispersed in the plating bath. In a more particular embodiment of the invention, a magnetic thin film manufacturing method is characterized by the fact that [a] the aforementioned two or more types of ions selected from a set consisting of Fe2+ ions, Ni2+ ions and Co2+ ions are supplied by means of sulfates and/or chlorides, [b] the plating bath is an acidic bath, and [c] the fine particles of an insulating material that are dispersed in the plating bath are colloidal particles of SiO2 and/or Al2O3.
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申请公布号 |
US5935403(A) |
申请公布日期 |
1999.08.10 |
申请号 |
US19970881300 |
申请日期 |
1997.06.24 |
申请人 |
READ-RITE SMI CORPORATION |
发明人 |
SUZUKI, KOICHI;KOMAKI, KENJI |
分类号 |
C25D5/26;C25D15/02;G11B5/31;H01F10/00;H01F10/16;H01F41/26;(IPC1-7):C25D15/00 |
主分类号 |
C25D5/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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