| 摘要 |
PROBLEM TO BE SOLVED: To enable forming conducting members with small separating width, by forming a self-supporting wall of an insulating film by lithography, and forming conducting members sandwiching the self-supporting wall. SOLUTION: A protrusion constituted of a second insulating film is formed on a first insulating film by lithography, and a third insulating film is formed so as to cover the upper part of the protrusion and its sidewall. The third insulating film is etched back, and the protrusion is eliminated. Then a wall constituted of a third insulating film is left on the first insulating film in a self-supporting state. When conducting members are formed sandwiching the self-supporting wall, arrangement where separating width between the conducting members is small is enabled. Regarding the above self-supporting wall of the insulating films, when KrF laser light is used as a light for exposure of photoresist, the wavelength of the light is 0.248 μm, and a separating width of 0.05-0.1 μm which is smaller than the wavelength can be realized. |
