PRODUCTION OF COLOR FILTER AND ALIGNMENT MARK

摘要

PROBLEM TO BE SOLVED: To provide high contrast under blue resist when using red alignment light. SOLUTION: A red filter 24 and a red alignment mark 25 are simultaneously formed by performing exposure alignment while using a base alignment mark 22. When forming a blue filter 27, a filter pattern is formed on blue resist 26 by performing exposure alignment due to red alignment light 28 using the red alignment mark 25. Thus, when forming the blue filter 27, the red alignment mark 25 not to absorb the red alignment light is used so that the quantity of reflected light R1 and R1 ' concerning the red alignment mark 25 can be increased. As a result, the high contrast can be provided at the time of forming the blue filter 27.