发明名称 SOLUTION SYNTHESIS OF MIXED-METAL CHALCOGENIDE NANOPARTICLES AND SPRAY DEPOSITION OF PRECURSOR FILMS
摘要 <p>A colloidal suspension comprising metal chalcogenide nanoparticles and a volatile capping agent. The colloidal suspension is made by reacting a metal salt with a chalcogenide salt in an organic solvent to precipitate a metal chalcogenide, recovering the metal chalcogenide, and admixing the metal chalcogenide with a volatile capping agent. The colloidal suspension is spray deposited onto a substrate to produce a semiconductor precursor film which is substantially free of impurities.</p>
申请公布号 WO1999037832(A1) 申请公布日期 1999.07.29
申请号 US1999001434 申请日期 1999.01.22
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