发明名称 PRODUCTION OF THIN FILM AND SPUTTERING DEVICE THEREFOR
摘要 PROBLEM TO BE SOLVED: To reduce the generation of splashes forming micro-defects by detecting the drop of the voltage between cathode and anode electrodes to detect the generation of arc discharge, cutting off the feed of electric power applying voltage to between the electrodes within specified time after the generation of the discharge, restarting the feed of electric power after specified time and again starting sputtering. SOLUTION: The space among a DC power source 12, a target board (cathode electrode) 13 and a substrate mounting stand (anode electrode) 14 is provided with an arc discharge cut-off device 11. This device is provided with a surge voltage detecting device such as a voltmeter detecting the rapid drop of voltage between the anode and cathode, a cut-off circuit rapidly cutting off the feed of electric power within prescribed time after the detection of surge voltage and an electric power restarting circuit executing the restart of the feed of electric power after prescribed time. Concretely, the feed of electric power is cut off within 1μsec from the generation of arc discharge, and within 5 to 15μsec after that, the feed of electric power is restarted.
申请公布号 JPH11200036(A) 申请公布日期 1999.07.27
申请号 JP19980006960 申请日期 1998.01.16
申请人 TOSHIBA CORP 发明人 TSUJI HIROSHI
分类号 G02F1/1343;C23C14/34;C23C14/38;(IPC1-7):C23C14/34;G02F1/134 主分类号 G02F1/1343
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