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经营范围
发明名称
CONCENTRATION CONTROL METHOD FOR PHOSPHORIC ACID BATH FOR SEMICONDUCTOR TREATMENT AND APPARATUS THEREFOR
摘要
申请公布号
JPH11200072(A)
申请公布日期
1999.07.27
申请号
JP19980017917
申请日期
1998.01.14
申请人
TEXAS INSTR JAPAN LTD
发明人
OTAKE SEIJI
分类号
C23F1/08;H01L21/306;H01L21/308;(IPC1-7):C23F1/08
主分类号
C23F1/08
代理机构
代理人
主权项
地址
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