发明名称 |
SURFACE MODIFICATION OF MEDICAL IMPLANTS |
摘要 |
An irregularly etched metallic medical implant device is provided having random non-uniform relief patterns on the surface ranging from about 0.3 mu m to less than about 20 mu m in depth. The random, irregular surface as defined by the etch micromorphology and respective dimensional properties is obtained by exposing a surface to a reactive plasma in a chamber wherein said reactive plasma produces a reaction product with the surface to thereby etch the surface, said reaction product or a complex thereof having a vapor pressure lower than a pressure in the chamber; providing a dynamic masking agent during the etching process; and removing the reaction products.
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申请公布号 |
WO9936276(A1) |
申请公布日期 |
1999.07.22 |
申请号 |
WO1999US00912 |
申请日期 |
1999.01.15 |
申请人 |
ETEX CORPORATION |
发明人 |
LEE, DOSUK, D.;NAGRAS, ATUL;CHAKRAVARTHY, PRAMOD;MAJAHAD, ANTHONY, M. |
分类号 |
A61L27/00;A61L27/38;A61L27/50;A61L27/56;B44C1/22;C23C14/34;C23F4/00;(IPC1-7):B44C1/22;C03C25/06 |
主分类号 |
A61L27/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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