| 摘要 |
<p>An apparatus (10) for storage and dispensing of a gas, comprising a gas storage and dispensing vessel (12) holding a physical sorbent medium (16) and gas adsorbed on physical sorbent medium (16), wherein a carrier gas, e.g., helium, hydrogen, argon, etc., is flowed through vessel (12) to effect desorption of the sorbate gas and entrainment of the desorbed gas in the carrier gas stream. The storage and dispensing system (10) of the invention may be employed to provide the dispensed sorbate gas to a downstream locus of use in applications such as epitaxial film formation and ion implantation, in the manufacture of semiconductor devices.</p> |
