| 摘要 |
PROBLEM TO BE SOLVED: To uniformly introduce fresh processing solution over the entire width of the surface of a photosensitive material by making the widths of the slot nozzles so that the processing solution, which comes out from the nozzles, has the width that is larger than the width of the photosensitive width. SOLUTION: Assemblies 12, 13 and 15, slot nozzles 17a, 17b and 17c and a back plate 9 are designed to minimize the amount of the processing solution contained in processing paths 25, a container 11, a circulating device and gaps 49a, 49b, 49c and 49d. The widths of the nozzles 17a, 17b and 17c are formed so that the processing solution comes out from the nozzles becomes larger than the width of a photosensitive material 21. The material 21 passes through rollers 30 and 31, enters into processing paths 25, passes the plate 9 and the nozzle 17a. Then, the material 21 moves through rollers 22 and 23, the plate 9 and the nozzles 17b and 17c. Then, the material 21 moves between rollers 32, 33, 130 and 131 and passes the paths 25. |
