发明名称 DRAM cell capacitor fabrication method
摘要 A method for making a cell capacitor of a semiconductor device such as a dynamic random access memory includes steps for increasing the height of a capacitor electrode. With increased height, the capacitance of the fabricated capacitor is increased while allowing high integration.
申请公布号 US5923972(A) 申请公布日期 1999.07.13
申请号 US19960703329 申请日期 1996.08.23
申请人 LG SEMICON CO., LTD. 发明人 LEE, SANG-DON
分类号 H01L21/28;H01L21/822;H01L21/8242;H01L27/04;H01L27/108;(IPC1-7):H01L21/824 主分类号 H01L21/28
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