| 摘要 |
PROBLEM TO BE SOLVED: To form a resist pattern excellent in adhesion to a substrate by incorporating a specified compd. having a specified average mol.wt. and contg. a specified amt. of polyethylene oxide groups based on the mol.wt. SOLUTION: The photoresist compsn. contains a compd. represented by formula I, having an average mol.wt. of 1,000-40,000 and contg. 5-90 wt.% polyethylene oxide groups based on the mol.wt. and/or a compd. represented by formula II, having an average mol.wt. of 2,000-30,000 and contg. 5-90 wt.% polyethylene oxide groups based on the mol.wt. as an adhesion enhancer. In the formulae I and II, A is a polypropylene oxide group and B is a polyethylene oxide group. Each of the compds. represented by the formulae I and II is a block copolymer of hydrophobic polypropylene oxide groups A [polymer groups having -CH(CH3 )CH2 O- as constituent units] and hydrophilic polyethylene oxide groups B [polymer groups having -CH2 -CH2 -O- as constituent groups] and the compds. are known as nonionic surface active components. |
