| 摘要 |
A projection exposure apparatus includes an illumination optical system for illuminating a mask with light from a light source, and a projection optical system having a diffractive optical element, for projecting an image of a pattern of the mask, as illuminated, on to a substrate, wherein the diffractive optical element is adapted to produce first diffraction light of first order to be used for formation of the image and second diffraction light of second order different from the first order, to be projected on the substrate to provide there a substantially uniform intensity distribution. <IMAGE> |
