| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing device and method whereby nonuniformity of polishing can be easily corrected, and to polish so as to adjust a stock removable in aimed partial region of a polishing surface. SOLUTION: This device has a turntable 5 sticking a polishing cloth 6 in an upper surface and a top ring 1, a polishing object 4 is interposed between the turntable 5 and the top ring 1, and by pressing with prescribed force, the polishing object 4 is polished into flatness and mirror finished. Here, in a hold surface with the top ring 1 holding the polishing object, a plurality of vacuum suction possible openings 10 , 20 are provided, a plurality of the openings 10 , 20 are divided into a plurality of regions C1 , C2 , C3 , and vacuum suction is made possible in each region. |
