发明名称 CHARGED PARTICLE DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To eliminate electrification of a sample by providing an electron gun irradiating electrons with an incident density substantially equal to a charging current density equivalent to a sample potential, which is increased according to incident of a primary particle on a sample and discharge of a secondary electron. SOLUTION: An electron gun 15 irradiates electrons with an incident rate density substantially equal to a charging current density equivalent to a sample potential, which is increased according to incident of a primary particle on a sample and discharge of a secondary electron. That is, by means of an electrification eliminating device 14, electrons are additionally irradiated so as to supplied to a charged position (observation area) generated in a sample 9 because of a lack of electrons due to radiation of secondary electrons. The electrons irradiated from the electrification eliminating device 14 are irradiated to the sample 9 at a low acceleration voltage 50 V, so that additional generation of secondary electrons can be suppressed. In a scanning type electron microscope constructed in this way, electrification of the sample 9 is positive, so that negative electrons insufficient for the sample 9 in the charged part are directly added by means of the electron gun 15. Consequently, electrification in the sample can be prevented.</p>
申请公布号 JPH11174008(A) 申请公布日期 1999.07.02
申请号 JP19970344796 申请日期 1997.12.15
申请人 HITACHI LTD 发明人 ORITSUKI RYOJI;HASHIMOTO KEN;EZAWA MASAYOSHI;SHIMASE AKIRA
分类号 G01N23/225;G21K5/04;H01J37/20;H01J37/252;H01J37/28;(IPC1-7):G01N23/225 主分类号 G01N23/225
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