发明名称 EQUIPMENT FOR ELIMINATING DAMAGE AND DAMAGE ELIMINATION METHOD OF SEMICONDUCTOR MANUFACTURING OFF-GAS
摘要 <p>PROBLEM TO BE SOLVED: To provide a equipment for eliminating damage for off-gas which can correspond to a multi-chamber type CVD with a single equipment, and has simple structure and small installation area, and provide a method for damage eliminating the off-gas which is able to eliminate damages safely, even if the installation area of the equipment is small. SOLUTION: This equipment for eliminating damage is provided with a plurality of independent damage eliminating equipment units which are connected with respective chambers 1 of a CVD 2, having a plurality of the chambers 1 by the use of an independent piping 4, and an exit scrubber 10 for collecting the gas treated with the damage eliminating equipment units and cleaning and cooling the gas together. The damage eliminating equipment units are provided with entrance scrubbers 5 and reaction cylinders as heating oxidizing decomposing zones 7.</p>
申请公布号 JPH11168067(A) 申请公布日期 1999.06.22
申请号 JP19970348632 申请日期 1997.12.02
申请人 KANKEN TECHNO KK 发明人 IMAMURA KEIJI
分类号 C23C16/44;B01D53/34;H01L21/205;(IPC1-7):H01L21/205 主分类号 C23C16/44
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