SURFACE-ANALYZING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a probe microscope which constitutes a means lessening a scattering light by a wafer pattern through irradiation with a beam light, thereby enabling distinction of a foreign article from a scattering light by the foreign article and a means enabling detection of a position of the foreign article. SOLUTION: A sample 1 is loaded on three-dimensional driving stages 3, 4, 5 via a sample holder 2. A surface of the sample 1 is irradiated with a beam light emitted from a beam light oscillator directly or via a polarizing element 7 different from a polarizing light of the beam light. An image of a foreign article on the surface of the sample 1 scattered by the beam light is displayed through a polarizing element 8 different from the beam light on a monitor 11 via a high-sensitivity CCD camera 10 mounted to an optical microscope 9. In order to guide the beam light onto the surface of the sample 1, there are ways, one using an optical fiber and another using an optical component such as a mirror or the like.