| 发明名称 |
Positive resist composition |
| 摘要 |
PCT No. PCT/JP94/02301 Sec. 371 Date Jun. 26, 1997 Sec. 102(e) Date Jun. 26, 1997 PCT Filed Dec. 28, 1994 PCT Pub. No. WO96/20430 PCT Pub. Date Jul. 4, 1996A positive resist composition comprising an alkali-soluble phenolic resin, a photosensitive agent composed of a quinonediazide sulfonate of a specific polyhydroxy compound, and an aromatic compound having at least one phenolic hydroxyl group.
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| 申请公布号 |
US5912102(A) |
申请公布日期 |
1999.06.15 |
| 申请号 |
US19970860365 |
申请日期 |
1997.06.26 |
| 申请人 |
NIPPON ZEON CO., LTD. |
发明人 |
KAWATA, SHOJI;KASHIWAGI, MOTOFUMI;KUSUNOKI, TETURYO;NAKAMURA, MASAHIRO |
| 分类号 |
G03F7/022;(IPC1-7):G03F7/023 |
主分类号 |
G03F7/022 |
| 代理机构 |
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