RAPID THERMAL PROCESSING METHOD FOR FERROELECTRIC, HIGH DIELECTRIC, ELECTROSTRICTIVE, SEMICONDUCTIVE, OR CONDUCTIVE CERAMIC THIN FILM USING MICROWAVES

摘要

A rapid thermal processing method for a ceramic thin film which is capable of carrying out a uniform heating of a large sized wafer, and of achieving a rapid temperature elevation, and of enhancing a crystallinity of a deposited thin film, wherein a thin film-coated material is disposed on a support to rapidly heat the thin film by the application of microwaves, the temperature is measured with a temperature measuring unit, and the generation of the microwaves is halted at a required temperature.