| 摘要 |
<p>A projection exposure system adapted to transfer a pattern of a mask (1) to an upper surface of a substrate (2), comprising a projection optical system (3) having a first reflective optical element (312) adapted to bend an optical axis (311), a first optical system (31) provided between the mask (1) and first reflective optical element (312), and a second optical system (32) provided between the first reflective optical element (312) and substrate (2); a stand (6) supporting together a first lens barrel (4) retaining the first optical system (31), and a second lens barrel (5) retaining the second optical system; and a connecting member (7) by which the first and second lens barrels (4, 5) are joined to each other in a position different from that of the stand (6), whereby minimizing vibration of lens barrels in the projection optical system and providing excellent imaging characteristics.</p> |
