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发明名称
Einrichtung und Verfahren zur Kontrolle und Durchführung der Ätzung eines Wafers
摘要
申请公布号
DE69228020(T2)
申请公布日期
1999.05.27
申请号
DE19926028020T
申请日期
1992.04.30
申请人
IPEC PRECISION, INC., BETHEL, CONN., US
发明人
ZAROWIN, CHARLES B., ROWAYTON, CT 06850, US;BOLLINGER, L.D., RIDGEFIELD, CT 06877, US
分类号
H01L21/302;H01J37/32;H01L21/00;H01L21/02;H01L21/304;H01L21/3065;H01L21/66;H01L21/762;H01L27/12;(IPC1-7):H01L21/321;H01L21/306;G01B11/06
主分类号
H01L21/302
代理机构
代理人
主权项
地址
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