A reactive ion etching process,申请号GB19990007302-传众专利搜索

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发明名称	A reactive ion etching process
摘要
申请公布号	GB9907302(D0)	申请公布日期	1999.05.26
申请号	GB19990007302	申请日期	1999.03.31
申请人	UNIVERSITY COURT OF THE UNIVERSITY OF, THE GLASGOW	发明人
分类号	G02B6/136	主分类号	G02B6/136
代理机构		代理人
主权项
地址

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