| 摘要 |
PROBLEM TO BE SOLVED: To provide a method in which an advantage of a surface imaging method using a resin material which has an aromatic ring structure, having high dry etching resistance and a negative type pattern is formed with high sensitivity, even in the case of a light lithography using an ArF excimer laser light source. SOLUTION: A lower layer resist 2 having a surface layer part comprising components including an aromatic ring and having a functional group which is protected by an acid decomposing group is formed on a substrate 1, a photosensitive layer 3 which is made of an applying material, virtually not having an absorbing band in an ArF excimer laser exposure wavelength and an acid precursor is formed thereon, a predetermined pattern exposure is performed, and acid is made to be generated at the exposure part. The functional group which is protected by the acid resolving group of the lower layer resist 2 contacting with the acid generating part 5 is protected. The photosensitive layer 3 is eliminated, the surface which is protected is exposed and processed by an reactive organic metal regent, and the lower layer resist 2 is exposed in an oxidizing atmosphere. |
