SEMICONDUCTOR DEVICE, BOARD FOR DISPLAY DEVICE AND MANUFACTURE OF LIQUID CRYSTAL DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To prepare a wiring pattern which can remove reaction product and is excellent in property without complicating a device when forming a wiring pattern of a semiconductor device. SOLUTION: A semiconductor board 108 wherein titanium or titanium compound and aluminum or aluminum alloy are laminated has a resist pattern formation process wherein photoresist is used, a dry etching process wherein gas containing chlorine is used making a resist pattern a mask and an ashing process for carrying out oxygen plasma treatment maintaining a semiconductor board at 230 to 260 deg.C while keeping vacuum after dry etching. In an ashing process, a wiring pattern is formed by successively carrying out a process for plasma treatment by adding gas containing at least fluorine and a process for plasma treatment by adding alcohol gas.