发明名称 Sputtering cathode
摘要 The sputtering cathode includes: a) single plate elements (9, 10, 11, 12) between the target (8) and the face plane (14) of the yoke (3); b) frame shaped plate elements (9, 10, 11) and the strip shaped plate element (12) form ring shaped gaps (a, b, c) which are roughly parallel to the face plane (14); c) magnets (7, ...) are incorporated into the yoke bottom (22) so that their face planes are flush with the yoke bottom.
申请公布号 DE19750270(A1) 申请公布日期 1999.05.20
申请号 DE19971050270 申请日期 1997.11.13
申请人 LEYBOLD SYSTEMS GMBH, 63450 HANAU, DE 发明人 ADAM, ROLF, 63450 HANAU, DE;BAEHR, MARTIN, DR., 63594 HASSELROTH, DE;KREMPEL-HESSE, JOERG, DR., 63683 ORTENBERG, DE
分类号 H01J37/34;(IPC1-7):H01J37/34;C23C14/34 主分类号 H01J37/34
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