发明名称 APPARATUS FOR REGENERATING AND RECOVERING PHOTORESIST DEVELOPER
摘要 PROBLEM TO BE SOLVED: To ensure the adsorption capacity of an ion exchange resin, to reduce the amt. of a material leached from the resin and to prevent the deterioration of the resin by disposing a temp. regulator which regulates the temp. of a concd. soln. of tetraalkylammonium ions behind an electrodialytic unit and/or an electrolytic unit. SOLUTION: A used developer fed from a used developer tank to an electrodialytic unit ED is separated into a desalted soln. and a concd. soln. This concd. soln. is sent to a heat exchanger HE as a temp. regulator, subjected to temp. regulation and further subjected to the regulation of the concn. of TAAH in a concn. regulator. When the concn. of TAAH in the concd. soln. is lower than a Prescribed concn., an aq. TAAH soln. having a high concn. of TAAH is added to the concd. soln. In the case of higher than the prescribed concn., ultrapure water UPW is added to the concd. soln. The concd. soln. is then sent to a membrane treatment unit MF to remove fine particles of impurities and the resultant regenerated developer is sent to a developing device and used in the development of a photoresist.
申请公布号 JPH11128691(A) 申请公布日期 1999.05.18
申请号 JP19970309583 申请日期 1997.10.24
申请人 JAPAN ORGANO CO LTD 发明人 SUGAWARA HIROSHI;HENMI HIROMI
分类号 G03F7/32;B01D61/02;B01D61/44;C02F1/42;C02F1/461;C02F1/469;H01L21/027;(IPC1-7):B01D61/44 主分类号 G03F7/32
代理机构 代理人
主权项
地址