发明名称 THERMAL STENCIL BASE-PAPER
摘要 PROBLEM TO BE SOLVED: To provide thermal stencil base-paper in which in the case of transferring photothermal conversion material on thermal stencil base-paper and irradiating the same with visible light or infrared radiation and performing plate- making, uniform punching dots are efficiently formed by effectively utilizing both irradiation light energy and heat energy generated by the photothermal conversion material. SOLUTION: The thermal stencil base-paper is equipped with a thermoplastic resin film 2 in which the light-shielding layer 3 of visible light or infrared radiation is formed on the face of at least one side. Furthermore, the thermal stencil base paper may be provided with a liquid absorption layer 1 on a face of at least one side or may be provided with the liquid absorption layer 1 on the face of at least one side and with a porous supporting body 5 having ink-passing properties on the face of the other side. It is desirable in the thermal stencil base-paper that shielding rate for light of 0.3-2μm wavelength is >=30% as a whole, and further whiteness index desirably is >=30.
申请公布号 JPH11129642(A) 申请公布日期 1999.05.18
申请号 JP19970316408 申请日期 1997.10.31
申请人 RISO KAGAKU CORP 发明人 WATANABE HIDEO
分类号 B41N1/24;(IPC1-7):B41N1/24 主分类号 B41N1/24
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