发明名称 SPATIALLY UNIFORM DEPOSITION OF POLYMER PARTICLES DURING GATE ELECTRODE FORMATION
摘要 <p>A method for uniformly depositing polymer particles (800) onto the surface of a gate metal layer during the formation of a gate electrode. In one embodiment, the present invention comprises immersing a substrate (906) having a layer of a gate metal disposed over the surface thereof in a fluid bath (902) containing polymer particles. Additionally, in the present embodiment, the layer of gate metal disposed over the substrate has approximately the same thickness as a desired thickness of the gate electrode to be formed. Next, the present embodiment applies a uniform potential across the surface of the layer of gate metal such that the polymer particles (800) are uniformly deposited onto the layer of gate metal with a spatial density of approximately 100,000,000 to 1,000,000,000,000 particles per square centimeter. In the present embodiment the polymer particles adhere to the surface of the layer of gate metal via Van der Waal's forces and/or via a charge difference between each particle and the layer of gate metal. The present embodiment then removes the substrate having the layer of the gate metal and the particles deposited thereon from the fluid bath.</p>
申请公布号 WO1999023681(A1) 申请公布日期 1999.05.14
申请号 US1998015095 申请日期 1998.07.21
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