| 摘要 |
A projection optical system and an electron optical system are mounted in a vacuum chamber in a side-by-side relationship to each other. An interferometer system controls the position of a substrate stage such that each of the projection optical system and the electron optical system can expose a radiation-sensitive substrate placed on the substrate stage. Therefore, combined exposure can be performed by using light and an electron beam in the same system. For example, the greater part of a predetermined pattern is formed on a radiation-sensitive substrate by exposure using light, and particularly fine pattern elements are formed by exposure using an electron beam. Alternatively, a pattern is formed on a radiation-sensitive substrate by exposure using light, and then exposure is carried out by using an electron beam to correct the pattern formed by the exposure using light. <IMAGE> |
