| 摘要 |
PROBLEM TO BE SOLVED: To obtain the stable stripping solution capable of removing the photoresist, and capable of making removing of polymers produced by etching compatible with prevention of corrosion of a substrate, and restraining the change of performance during storage and use, by incorporating an organic amine, water, a specified hydroxyl compound, and an water-compatible organic solvent. SOLUTION: The photoresist stripping solution contains an organic amine, water, a water-containable organic solvent, and a hydroxyl compound representd by the formula, in which R1 is an amino group adjacent to a hydroxyl group, carboxy, amido, or an acyl group; R2 is H atom or hydroxy, an alkyl, cycloalkyl aryl, aralkyl, alkoxy, sulfo, amino, carboxy, amido, acyl, 1-3C alkyl carboxylate, or a 1-3C alkyl sulfonate, and R2 is optionally substituted; and Z is a residual group necessary to form an optionally substituted 5- or 6-membered heterocyclic or aromatic ring. |
