CHEMICAL SUPPLYING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a chemical supplying apparatus by which chemical can be constantly supplied to a treating apparatus. SOLUTION: A slurry supplying apparatus 11 is provided with mixing tanks 12a and 12b whose capacity is set in accordance with the necessary amount of slurry which is used for one treatment in polishing devices 18a and 18b. A controlling device supplies a necessary amount of undiluted slurry 15 and 16 and pure water to the mixing tanks 12a and 12b and dilutes and mixes them to form slurry 17. Then the controlling device supplies the slurry 17 formed in this way to the polishing devices 18a and 18b. Accordingly, since only a necessary amount of slurry 17 for the polishing devices 18a and 18b is formed in the mixing tanks 12a and 12b, no excessive slurry remains after forming.