| 发明名称 |
Device for plasma processing of gases |
| 摘要 |
An apparatus (1) for the processing of gaseous media by means of a plasma wherein there is included at least one electrode (16, 14) which is maintained in position in relation to another by one or more insulating support structures (7, 8) made of a micaceous glass material. |
| 申请公布号 |
AU9361598(A) |
申请公布日期 |
1999.05.10 |
| 申请号 |
AU19980093615 |
申请日期 |
1998.10.09 |
| 申请人 |
AEA TECHNOLOGY PLC |
发明人 |
DAVID MICHAEL WEEKS;DAVID LESLIE SEGAL |
| 分类号 |
F01N3/08;B01D53/32;B01D53/92;B01J19/08 |
主分类号 |
F01N3/08 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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