发明名称 |
LENS ARRAY PHOTOLITHOGRAPHY |
摘要 |
An apparatus and method for photolithographic exposure of a substrate including an illumination source for providing light for producing an image on the substrate, a mask including a pattern for projection onto the substrate, a lens assembly for projecting the light through a plurality of lens channels onto the substrate and an actuator for moving the lens assembly in a plane parallel to the mask and the substrate for suppressing interference effects.
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申请公布号 |
WO9921060(A1) |
申请公布日期 |
1999.04.29 |
申请号 |
WO1998US22525 |
申请日期 |
1998.10.22 |
申请人 |
HUGLE LITHOGRAPHY |
发明人 |
CULLMANN, ELMAR;VOLKEL, REINHARD;WELLS, KARIN, M. |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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