| 摘要 |
The present invention provides a method for inspecting only a contamination which there is a possibility to have an actual influence during exposure on a mask. In this method, a mask comprises at least two areas, each of which has a shade pattern, a first inspection light is introduced to the one face of a first area, a second inspection light to another face of a second area. An image transmitting through the first area and an image reflected by the second area are received and composed to obtain a first composite image. Then, an image reflected by the first area and an image transmitting through the second area are received and composed to obtain a second composite image. Thereafter, a contamination on the mask is indicated based on the first composite image and the second composite image. |
