发明名称 RETAINING EQUIPMENT OF SUBSTRATE OR THE LIKE
摘要 PROBLEM TO BE SOLVED: To facilitate detaching work of a substrate or the like and prevent the substrate or the like from being charged and deteriorated and being bent and deformed. SOLUTION: This equipment is constituted of a retaining block 1 on which a mounting surface 11 capable of mounting a substrate P or the like from above is arranged, and a moving mechanism 2 for moving the retaining block 1. In the retaining block 1, a tapered surface 12 which is slantingly stretched from the mounting surface 11 to the upside and is made to abut against only the corner part Pc of the upper surface of the substrate P or the like by moving the retaining block 1 is arranged. The moving mechanism 2 is equipped with an X-Y moving structure.
申请公布号 JPH11112195(A) 申请公布日期 1999.04.23
申请号 JP19970273026 申请日期 1997.10.06
申请人 GTC:KK 发明人 YATABE RYUJI
分类号 H05K13/02 主分类号 H05K13/02
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