发明名称 LAMINATING METHOD OF PHOTOSENSITIVE FILM
摘要 PROBLEM TO BE SOLVED: To cover a rugged surface of a substrate without intrusion of bubbles, to easily cover various forms of rugged patterns and to prevent increase of the cost and decrease of workability by pressing the opposite surface of a protective film to a photosensitive layer on a flexible supporting body with a face having a rugged pattern, removing the protective layer and laminating the photosensitive layer on a substrate. SOLUTION: When a photosensitive film on a flexible supporting body is to be laminated on a substrate, one surface of a protective film opposite to the photosensitive layer is pressed with a face having a rugged pattern, then the protective film is removed and the photosensitive layer is laminated on a substrate. As for the face having a rugged pattern used to press, a flat face or a roll face can be used. The rugged pattern may be stripes or grids and is not specified. The surface roughness Ra is preferably 20 to 500% of the thickness of the protective film of the photosensitive film, and more preferably 20 to 150%. The pressure and heating temp. to press the photosensitive layer depend on the fluidity of the photosensitive layer and are preferably 0.5 to 10 kg/cm<2> and 40 to 150 deg.C, respectively.
申请公布号 JPH11109618(A) 申请公布日期 1999.04.23
申请号 JP19970267558 申请日期 1997.09.30
申请人 HITACHI CHEM CO LTD 发明人 SASAHARA NAOKI;TSUCHIYA KATSUNORI;NAKANO AKIO;YOSHIDA TETSUYA
分类号 G03F7/004;B32B15/08;G03F7/11;G03F7/38;H05K3/00;(IPC1-7):G03F7/004 主分类号 G03F7/004
代理机构 代理人
主权项
地址