发明名称 Annular housing for rotary carrier in semiconductor wafer processing
摘要 The housing (1) has at least one annular duct (10) in radial extension of a deposition face (2a) of the carrier (2) for the wafer (3). Adjacent to the duct(s) extends in the housing at least one suction device (6,8), starting at the housing inner wall (10). The suction device is located above the annular duct and consists of several suction nozzles uniformly distributed along the housing inner wall.
申请公布号 DE19807460(A1) 申请公布日期 1999.04.15
申请号 DE19981007460 申请日期 1998.02.21
申请人 SEZ SEMICONDUCTOR-EQUIPMENT ZUBEHOER FUER DIE HALBLEITERFERTIGUNG AG, VILLACH, AT 发明人 LANGEN, KURT, DIPL.-ING., VILLACH, AT
分类号 H01L21/00;H01L21/683;(IPC1-7):H01L21/68;H01L21/306;H01L21/30 主分类号 H01L21/00
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