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发明名称
HEAT TREATMENT FURNACE FOR SEMICONDUCTOR WAFER
摘要
申请公布号
JPH1197366(A)
申请公布日期
1999.04.09
申请号
JP19970259002
申请日期
1997.09.24
申请人
ROHM CO LTD
发明人
KAGEYAMA SATOSHI
分类号
H01L21/26;(IPC1-7):H01L21/26
主分类号
H01L21/26
代理机构
代理人
主权项
地址
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