| 摘要 |
A method of treating industrial fabrics such as papermachine clothing, wherein at least one surface of the fabric, or of the yarns, fibres, strips or membranes from which such a fabric is made, is modified by using high energy electromagnetic radiation, from excimer or ablation lasers. This may be used to alter the hydrophilic/hydrophobic properties of the surface by etching on a micron scale. Selective masking at any desired scale may be used.
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