| 摘要 |
An electron beam microscope includes an electron beam pattern source (10), a vacuum enclosure (34), electron optics (16), a detector (24) and a processor (30). The electron beam pattern source generates a sequence of electron beam patterns for illuminating a set of pixels on a specimen (20). The electron optics directs the sequence of electron beam patterns to the specimen. The detector detects a result of an interaction between each of the electron beam patterns and the specimen and produces a sequence of detector sinals (26). The processor, in response to the sequence of detector singals, generates an image including a pixel value representative of each of the illuminated pixels on the specimen. The electron beam microscope preferably includes a deflector (18) for deflecting each of the electron beam patterns relative to the specimen.
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