GRATING BOTTOM PLATE IN A SEMICONDUCTOR PROCESS CHAMBER,申请号KR19960000828-传众专利搜索

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发明名称	GRATING BOTTOM PLATE IN A SEMICONDUCTOR PROCESS CHAMBER
摘要
申请公布号	KR0174989(B1)	申请公布日期	1999.04.01
申请号	KR19960000828	申请日期	1996.01.17
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人
分类号	H01L21/00;(IPC1-7):H01L21/00	主分类号	H01L21/00
代理机构		代理人
主权项
地址

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