发明名称 |
Method and apparatus for removing a liquid from a surface of a rotating substrate |
摘要 |
A method and an apparatus for removing a liquid, i.e a wet processing liquid, from a surface of at least one substrate is disclosed. A liquid is supplied on a surface of substrate. Simultaneously or thereafter besides the liquid also a gaseous substance can be supplied thereby creating at least locally a sharply defined liquid-vapor boundary. The gaseous substance and the liquid can be selected such that the gaseous substance is miscible with the liquid and when mixed with the liquid yields a mixture having a surface tension lower than that of the liquid. According to the invention, the substrate is subjected to a rotary movement at a speed to guide said liquid-vapor boundary over said substrate thereby removing said liquid from said substrate. <IMAGE> |
申请公布号 |
EP0905747(A1) |
申请公布日期 |
1999.03.31 |
申请号 |
EP19980870200 |
申请日期 |
1998.09.22 |
申请人 |
INTERUNIVERSITAIR MICRO-ELEKTRONICA CENTRUM VZW |
发明人 |
MERTENS, PAUL;MEURIS, MARK;HEYNS, MARC |
分类号 |
F26B5/08;H01L21/00;H01L21/304;H01L21/306;H01L21/308 |
主分类号 |
F26B5/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|