Scanning-slit exposure device

摘要

A scanning-slit exposure device is provided with a radiation source (1) emitting radiation pulses through an exit window (2). An imaging system (3) images the exit window onto a surface (4) to be exposed by the radiation. The surface is scanned relative to the exit window image in a scan direction. To avoid the banding-type non-uniformities in the exposure, the device comprises a scattering element (12) which scattering element causes a blur of the exit window image only in the scan direction. The scattering element is arranged in the entrance pupil of the imaging system (3).