IMPEDANCE MATCHING AND POWER CONTROL SYSTEM FOR HIGH FREQUENCY PLASMA PROCESSING DEVICE,申请号JP19970264844-传众专利搜索

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发明名称	IMPEDANCE MATCHING AND POWER CONTROL SYSTEM FOR HIGH FREQUENCY PLASMA PROCESSING DEVICE
摘要
申请公布号	JPH1187097(A)	申请公布日期	1999.03.30
申请号	JP19970264844	申请日期	1997.09.10
申请人	ADTEC:KK	发明人	FUJII SHUITSU
分类号	H05H1/46;C23C14/54;C23C16/50;H01L21/203;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H03H7/40;(IPC1-7):H05H1/46	主分类号	H05H1/46
代理机构		代理人
主权项
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