| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photoresist compsn. excellent in various properties such as sensitivity, resolution, profile, resistance to leaving after exposure, heat resistance, the rate of a residual film and suitability to coating by using a resin contg. polymn. units each having a specified hindered piperidine skeleton. SOLUTION: The photoresist compsn. contains a resin contg. polymn. units each having a hindered piperidine skeleton represented by the fomula and convertible into an alkali-soluble resin by the action of an acid from the alkali- insoluble or slightly alkali-soluble state and an acid generator. In the formula, R is H, alkyl or alkanoyl. The hindered piperidine skeleton means a structure in which two alkyl groups are disposed at each of the 2- and 6-positions of a piperidine ring with N at the 1-position to cause steric hindrance to the N. The resin includes a resin obtd. by protecting at least part of the phenolic hydroxyl groups of polyvinyl alkali resin contg. hindered piperidine skeletons with groups which are cleaved by the action of an acid. |
