发明名称 CARBON BLACK FOR FORMING BLACK RESIST PATTERN
摘要 PROBLEM TO BE SOLVED: To obtain the subject carbon black that gives a coating solution with a good developing properties by covering carbon black containing different kinds of particles having different average primary particle sizes where the weight ratio of the maximum particle size to the minimum particle size is specified with a resin. SOLUTION: Carbon black that contains 2 or more kinds of carbon blacks different in the average particle size by at least 20 nm and has the weight ratio of the particles having the maximum particle size to those having the minimum particle size of 1/(0.1-10) and pure water are mixed with a homo-mixer to prepare a slurry. Then, the slurry is charged into a vessel equipped with a screw type stirring machine, and an epoxy resin solution in toluene is added gradually under stirring until the carbon black dispersed in water is transferred to the toluene phase, then the carbon black is drained on a wire screen of 60 mesh and dried in a vacuum drier whereby the objective carbon black for forming black resist patterns is obtained.
申请公布号 JPH1180584(A) 申请公布日期 1999.03.26
申请号 JP19970249908 申请日期 1997.08.29
申请人 MITSUBISHI CHEM CORP;MIKUNI SHIKISO KK 发明人 HISA HIDEYUKI;MORI TAIZO
分类号 G03F7/004;C09C1/56;C09C3/10;G02B5/20;G02F1/1335 主分类号 G03F7/004
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