发明名称 Epitaxial wafer device including an active layer having a two-phase structure and light-emitting device using the wafer
摘要 An epitaxial wafer for a light-emitting device has a double hetero-structure and includes a single-crystal substrate, a lower cladding layer of AlGaN grown on the substrate, an active layer grown on the lower cladding layer, the active layer having a two-phase structure comprised of a matrix of AlxGayInzN and crystallets of AlaGabIncN, and an upper cladding layer of AlGaN grown on the active layer.
申请公布号 US5886367(A) 申请公布日期 1999.03.23
申请号 US19970906935 申请日期 1997.08.06
申请人 SHOWA DENKO K.K. 发明人 UDAGAWA, TAKASHI
分类号 H01L21/205;H01L33/00;H01L33/16;H01L33/32;(IPC1-7):H01L29/04 主分类号 H01L21/205
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