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发明名称
METHOD FOR FORMING A PHOTORESIST PATTERN
摘要
申请公布号
KR0170941(B1)
申请公布日期
1999.03.20
申请号
KR19950038064
申请日期
1995.10.30
申请人
DAEWOO ELECTRONICS CO.,LTD
发明人
NOH, JAE-WOO
分类号
G03F7/00;(IPC1-7):G03F7/00
主分类号
G03F7/00
代理机构
代理人
主权项
地址
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