MULTIPLE EDGE DEPOSITION EXCLUSION RINGS

摘要

An exclusion ring system for depositing a film with multiple exclusion zones on a substrate (38) in a deposition apparatus (12) having a pedestal (20) for supporting the substrate at different positions. A first exclusion ring (56) is positioned above the substrate and pedestal end extends over a first zone overlying the perimeter (65) of the substrate up to a first inner periphery. A second ring (58) is positioned between the first ring and the substrate and extends over a second zone overlying the perimeter (75) of the substrate outwardly of the first zone to a second inner periphery lying outwardly of the first inner periphery. Initially, the first ring is in a position (A) proximate to the substrate to prevent deposition of the first film over the first zone. The pedestal is lowered to a second position (B) so that the second film is deposited over the first and second zones.