Bromine etch process for silicon,申请号EP19870311196-传众专利搜索

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发明名称	Bromine etch process for silicon
摘要
申请公布号	EP0272143(B1)	申请公布日期	1999.03.17
申请号	EP19870311196	申请日期	1987.12.18
申请人	APPLIED MATERIALS, INC.	发明人	WONG, JERRY YUEN KUI;CHANG, MEI;MAYDAN, DAN;WANG, DAVID NIN-KOU;MAK, ALFRED W. S.
分类号	H01L21/302;H01L21/3065;H01L21/3213;H01L21/762;(IPC1-7):H01L21/306;H01J37/32	主分类号	H01L21/302
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